Large Scale Interference Lithography System
Fraunhofer Center for Manufacturing Innovation
- © 2005 Fraunhofer CMI.
High capacity, accurate diffraction grating production
- Constructed high-performance system for large, interference lithography substrates
- Substrate dimensions:
1.0 m x 0.5 m
- Maximum load:
100 kilograms
- Diffraction grating periodicity:
0.2 - 5 micron
- Line placement accuracy:
2.5 nanometers over entire substrate - Temperature control precision:
±0.005 °C
Further Information
Set Bookmark